CORRESP. Complex oxides by reactive sputtering: from experiment to simulations
Thin film research has moved from simple oxide thin film materials towards thin films with a high chemical complexity and microstructure. This high level research asks for in-depth analysis tools and new deposition strategies in combination with simulations.
In the framework of CORRESP. four research groups will combine their effort to unravel the growth of chemical complex oxide thin films, and to train Master and PhD students in the different topics related to this subject.
The major goal of the CORRESP. research project is to establish a cooperation between several research groups interested in reactive magnetron sputter deposition, solid-ion interactions and complex oxide materials.
CORRESP. forms a platform for exchanging students and researchers between the partners universities - or stated differently: for CORRESPondence between the research partners.This platform has the aim of strengthening the research and educational activities at the participating nodes within the field of materials and surface engineering. On the educational level our aim is to create an exchange of Master students, Ph.D. students as well lecturers between participating nodes.